56.
(11) Patent number: 2147292
(46) Date of publication: 10.04.2000
(51) Int. Cl.7: C 01 B 33/107
(21) Application number: 99103236/12
(22) Application date: 18.02.1999
(71) Applicant:
Institut neorganicheskoj khimii SO RAN,
FUP Gorno-khimicheskij kombinat
(72) Inventor:
Reznichenko M.F.,
Kuchumov B.M.,
Kuznetsov F.A.,
Kuksanov N.K.,
Muravitskij S.A.,
Lavrukhin A.V.,
Korchagin A.I.,
Borisova L.A.
(73) Proprietor:
Institut neorganicheskoj khimii SO RAN,
FUP Gorno-khimicheskij kombinat
(98) Mail address:
630090, Novosibirsk, pr.akad.Lavrent'eva, 3, Institut neorganicheskoj khimii, patentnyj otde
(54) TRICHLOROSILANE PRODUCTION PROCESS
(57)
FIELD: silicon compounds technology. SUBSTANCE: process involves activation of silicon tetrachloride-hydrogen interaction by high-energy (0.5-2.5 MeV) electron beam in flow-type reactor containing tetrachloride-hydrogen gas-vapor mixture or any worked-out gas-vapor mixtures containing silicon tetrachloride. EFFECT: reduced power consumption. 2 cl, 4 ex
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